Porous TaC Yakaputirwa Graphite Ring

Porous TaC Coated Graphite Rings kubva kuSemixlab zvinhu zvakakosha munzvimbo dzakakwirira-inodiwa semiconductor, inopa kusimba kusingaenzaniswi, kugadzikana, uye kugadzirisa maitiro. Ndidzo sarudzo dzakakodzera dzeSiC epitaxy, GaN MOCVD, diffusion, uye CVD maitiro uko kuvimbika uye kuita kwakakosha.

Material & Properties

● Graphite Base: High-density isostatic graphite ine porous chimiro chekuderedza kupisa kwehuwandu uye kuwedzerwa kupisa kwekushisa.

● Tantalum Carbide Coating: High-melting-point tantalum carbide (3880 ° C) inochengetedza kuoma kwakanyanya, kusagadzikana kwemakemikari, uye kusimba kwenguva refu mumagasi akaoma.

● Porous Design: Inovandudza kuparadzirwa kwegasi, inoderedza kushungurudzika kwemunharaunda panguva yekukurumidza kupisa bhasikoro, uye kuderedza kusvibiswa kwezvikamu.

Semixlab Services

● Custom Design & Dimensions yakagadzirirwa kune chaiyo epitaxy kana midziyo yevira.

● High-Purity Materials kusangana zvakasimba semiconductor kusvibiswa zvinodiwa.

● Yakasimba Hunhu Kudzora kuve nechokwadi chekuputira ukobvu, kunamatira, uye porosity optimization.

● Global Technical Support ye semiconductor machira nevagadziri vemidziyo.

Bata Semixlab nhasi kukumbira samples, tekinoroji yakatarwa, kana yakagadziridzwa mhinduro.

Zvikumbiro zvakakosha muSemiconductor Maitiro

1. Epitaxy Maitiro (SiC, GaN, uye Si)

Mune epitaxial kukura maitiro akadai seMOCVD, CVD, uye SiC epitaxy, porous TaC yakavharwa graphite mhete inoita basa rakakosha mumagungano eku susceptor uye gasi kuyerera kwekudzora zvimiro. Dhizaini yavo yeporous inobatsira kudzora kugovera gasi, kudzivirira mhirizhonga uye kuve nechokwadi chekutakura yunifomu yekuendesa kune wafer pamusoro. Izvi zvinoguma nekuvandudzwa kwehukobvu hwekufanana, hurema hushoma, uye goho repamusoro remudziyo. Iyo TaC coating inodzivirira graphite substrate kubva kune hukasha precursors seHCl, NH₃, silane, uye hydrocarbons, kuwedzera hupenyu hwesevhisi pasi pekuenderera kwepamusoro-tembiricha mamiriro (> 1500 ° C).

2. Diffusion uye Annealing Furnaces

Munguva yekupararira kwedopant uye kudziya kwepamusoro-soro mushure mekuisirwa ion, mhete dze graphite dzinoshandiswa serutsigiro uye nekupisa kuenzanisa zvinhu mukati mechoto masisitimu. Chimiro chavo chine porous chinodzikisira huwandu hwekupisa, zvichigonesa kukurumidza kukwira-kumusoro uye kutonhora-pasi kutenderera uku ichidzikisa kushushikana kwekupisa pawafers. Iyo TaC coating inodzivirira oxidation uye kuparara kwemakemikari, kuve nechokwadi chekuti mhete inochengetedza kutendeseka kwechimiro kutenderera kunodzokororwa kupisa kutenderera. Nekudzikamisa nharaunda dzewafer, mhete idzi dzinobatsira kuwana anowirirana dopant profiles uye yakaderedzwa wafer warpage.

3. PECVD uye LPCVD Chambers

MuPECVD neLPCVD mareactor, porous TaC yakavharwa graphite mhete inoshanda semareni ekamuri, zvinodzivirira, kana marin'i ekutsigira. Idzi nharaunda dzinowanzo fumura zvinhu kune plasma bombardment uye magasi anoparadza zvakanyanya senge fluorine- uye chlorine-based marudzi. Iyo TaC coating inoratidza kupikisa kwepamusoro kune etching uye kukukurwa kweplasma, zvakanyanya kuderedza kudurura kwechikamu uye njodzi yekusvibiswa. Uyezve, iyo porous dhizaini inobatsira kubvisa kupisa zvakanyanya zvakaenzana, kuve nechokwadi kugadzikana kwemafirimu ekuisa mareti uye yakagadziridzwa maitiro ekudzokorora.

4. Etching uye Deposition Environments

Mune yakaoma etching uye yakaonda-firimu deposition maitiro, porous TaC yakavharwa graphite zvindori zvinoshanda sezvivharidzo zvinodzivirira uye kudzikamisa zvinhu zvinoderedza kuseri kwekuiswa uye plasma-induced kukukurwa kweakakosha reactor zvikamu. Kuomarara kwejasi uye kusasimba kwekemikari kunodzivirira kuita kusingadiwe nemagasi ekugadzirisa, kuderedza kusvibiswa kwenzvimbo. Kushandisa kwavo kwakakosha mukuchengetedza hutsanana hwekamuri, kuvandudza nguva, uye kudzivirira mawaferi emhando yepamusoro kubva pakusvibiswa kwegoho.