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TaC Coated Guide Ring
Semixlab's TaC-yakavharwa gwara mhete dzakagadzirirwa nzvimbo dzakaomarara dze semiconductor kugadzirisa. Zvichienderana nepamusoro-kuchena graphite kana silicon carbide substrate, iwo akapfeka zvakafanana tantalum carbide kuburikidza neCVD maitiro, zvichikonzera kupisa kwakanyanya uye kusagadzikana kwekuora. Seyakakosha wafer yekumisikidza uye inoyerera inotungamira zvikamu, idzi TaC-yakavharwa gwara mhete dzinovandudza zvakanyanya hutsanana uye kugadzikana. Semugadziri ane hunyanzvi, Semixlab inopa saizi yakajairwa, kuendesa nekukurumidza, uye rutsigiro rwenyanzvi. Iwo anoshandiswa zvakanyanya mu semiconductor thermal process senge diffusion uye epitaxy.
tsananguro
Semixlab's TaC Coated Guide Ring inogadzirwa nekurongeka uye kuita mundangariro, yakagadzirirwa kumirisana nemamiriro ekunze epamusoro-tembiricha uye inoparadza semiconductor yekugadzira nharaunda. Uchishandisa yepamusoro CVD TaC Coating (Chemical Vapor Deposition yeTantalum Carbide), chikamu ichi chinoburitsa kusimba kusingaenzaniswi, kugadzikana kwemafuta, uye makemikari kuramba.
SeTaC Coated Guide Ring Manufactureri akavimbika, Semixlab inopa mhinduro dzakarongedzerwa dzinoita kuti ienderane neyakasiyana siyana yekugadzira wafer masisitimu. Ingave ichinzi TaC Coated Diversion Ring, TaC inotungamira mhete, kana CVD TaC mhete, chikamu ichi chakakosha pakuchengetedza wafer kurongeka uye kuyerera kufanana mukupararira uye epitaxy application.
Ⅰ. Material Kuumbwa & Surface Coating
Hwaro hweSemixlab gwara remhete rinowanzo kuumbwa nepamusoro-kuchena graphite kana silicon carbide (SiC), yakasarudzwa nekuda kwechimiro chayo chekutendeseka uye kupisa conductivity. Iyo yepamusoro inobva yaputirwa neyunifomu yeTantalum Carbide (TaC) kuburikidza neiyo chaiyo CVD maitiro, ichigadzira dense, yakaoma, uye yakatsetseka chipingamupinyi chinoshingirira kupfeka, kurwisa kwemakemikari, uye kushatisa kwemafuta.
Zvinhu zvakakosha zveCVD TaC Coating:
● Kunyungudika kwepamusoro (~ 3880 ° C).
● Kunyatsopikisa HF, HCl, uye mamwe magasi ekugadzirisa.
● Kuomarara kunoshamisa (Mohs 9–10).
● Superior anti-particle shedding performance.
Ⅱ. Sei Kusarudza Semixlab?
Semixlab inomira kunze pakati peTaC yakavharwa gidhi mhete nekupa:
● Yakazara customizable dhizaini masevhisi kuti aenderane akasiyana reactor mhando.
● Tight dimensional kushivirira kwekubatanidzwa kusina musono.
● Yakaderera-particle yekugadzira nzvimbo inovimbisa kuchena uye kuchena.
Chikwata chedu chinoshanda padhuze ne semiconductor process mainjiniya kubatanidza-kugadzira akarongedzerwa Semixlab Yekutungamira Mhete mhinduro dzemitsetse yekugadzira yepamusoro. Chigadzirwa chega chega chinoongororwa zvakasimba kuti ive nechokwadi chekupfeka kufanana uye kurongeka kwechimiro chisati chaburitswa.
Applications
Zvishandiso muSemiconductor Manufacturing
1. Plasma Etching - Kuchengetedza Wafer Kutendeseka Pasi Reactive Plasma Environments
Mune advanced plasma etching process, uko mawaferi anooneswa kune akakwira-energy plasmas uye reactive gasi chemistries (seCF₄, SF₆, Cl₂, uye BCl₃), iyo TaC Coated Guide Ring inoshanda basa rakakosha:
inodzikamisa uye inochengetedza mutakuri wewafer kana susceptor, kudzivirira chero misalignment kana vibration inogona kukanganisa etch chaiyo.
Zvinotonyanya kukosha, iyo CVD-yakaiswa Tantalum Carbide coating inoumba kemikari inert chipingamupinyi chinoramba kukora uye kukukurwa neiyo reactive plasma marudzi. Izvi zvinodzivirira kushatiswa kwezvinhu uye kubvisa kudonhedzwa kwechikamu, chiri chikonzero chikuru chekusvibiswa kwemicro uye kurasikirwa kwegoho.
2. Chemical Vapor Deposition (CVD) & Physical Vapor Deposition (PVD) - Kuve nechokwadi cheUniform Thin Film Formation
Mune ese ari maviri CVD nePVD maitiro, chaiyo tembiricha yekudzora uye kuchena kwemakemikari kwakakosha kuti uwane yepamusoro-mhando yakaonda firimu deposition. Pakati pematanho aya, mhete yegwaro inobatsira kuisa iyo wafer yekutsigira sisitimu nenzira kwayo uye inova nechokwadi chekuti gasi rakafanana rekuyerera kugovera pane yawafer.
Iyo TaC coating, ine yakanyanya kunyungudika nzvimbo (~ 3880 ° C) uye yakaderera reactivity ine precursor magasi, inochengetedza kutendeseka kwechimiro kunyangwe pasi pekuchovha bhasikoro uye yakakwira vacuum mamiriro. Kusiyana negraphite isina kuvharwa kana simbi zvikamu, haibatike kana kutora magasi ekuita, izvo zvakakosha mukudzivirira kusvibiswa kwemakemikari.
Mabhenefiti Akakosha muCVD/PVD:
● Inodzivirira kukanganisa kana kuti dimensional kukukurwa panguva yepamusoro-tembiricha yefirimu kukura.
● Inova nechokwadi chekushanda kwakachena nekudzivirira kubuda kwegasi kana kusangana kwemakemikari.
● Inokwidziridza kuenzana kwekuisa pa200mm uye 300mm mawafer.
● Yakanakira kuisa mabhaisikopo epamusoro akadai seSiN, SiO₂, Al₂O₃, TiN, uye barrier layers.
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