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Tantalum Carbide TaC Coated Cover
Chifukidziro chakafukidzwa neTantalum Carbide (TaC) kubva kuSemixlab chakagadzirirwa kuve nechokwadi chekugadzikana kwekupisa uye kuchena munzvimbo dze semiconductor epitaxy. Yakagadzirwa zvakananga kune mapuratifomu eSi, SiC, uye GaN epitaxial reactor, TaC coated surface inodzivirira kupisa kwakanyanya uye mhepo ine makemikari akasimba, ichideredza kugadzirwa kwezvikamu uye kukanganiswa kwemakamuri. Nekuchengetedza nzvimbo yakadzikama yemukati uye kuderedza nzvimbo dzekusvibiswa, chifukidziro ichi chinotsigira mhando yenguva dzose ye epitaxial layer, nguva yakareba yekushandisa kwemidziyo, uye kuvandudzwa kwewafer goho pakugadzirwa kwe semiconductor yakawanda. Tinogamuchira kubvunza kwenyu.
tsananguro
Semugadziri mukuru wekuChina weTantalum Carbide (TaC) coated covers, maSemixlab's TaC coated cover plates akagadzirirwa nzvimbo dzepamusoro dzekukura kwe semiconductor epitaxial. Munzvimbo idzi, tembiricha, kugadzikana kwemakemikari, uye kudzora kusvibiswa zvinhu zvakakosha zvinosarudza goho remuchina. Ma covers aya akagadzirwa zvakananga kune Si, SiC, uye GaN epitaxial reactors, achishanda sechikamu chakakosha chekuvhara nekudzivirira mukati mekamuri re reaction, achidzivirira nzvimbo dzemukati kubva mukuora uye kusvibiswa kwezvikamu.
Kukura kwe epitaxial ye semiconductor, senge Si/SiC/GaN epitaxy, kunoda kuumbwa kwemafirimu matete asina kukanganisa pasi pemamiriro ezvinhu akaoma zvikuru. Hydrogen, magasi akavakirwa pa chlorine, ammonia, uye hydrocarbon precursors zvinogara zvichiita mumakamuri patembiricha dzinopfuura 1500°C. Makamuri ekare anokurumidza kuora pasi peiyi chemical nethermal stress, zvichikonzera kudonha kwezvikamu, kusvibiswa kwesimbi, uye kupfupisa nguva dzekuchengetedza. MaTaC edu akaputirwa anofukidza, ane nzvimbo yavo yekunyunguduka yakanyanya (inenge 3880°C), plasma nemakemikari zvinodzivirira zvakanyanya, uye chimiro chakasimba, chine porosity yakaderera, zvinodzivirira zvinosara pamusoro pemhinduro. Izvi zvinovimbisa mukati mekamuri rakachena, zvichideredza nzira dzekuumbwa kwezvikanganiso zvakaita sezvikamu, nzvimbo yekumusoro, uye kupararira kwefault pawafer.
Muma epitaxial reactors, kufanana kwekupisa uye kugadzikana kwemhepo inoyerera negasi zvakakosha kuti pave nekugadzikana kwewafer-to-wafer. Nekuchengetedza chimiro chakasimba uye nzvimbo dzisina reactive boundary, maTaC coated covers anobatsira kuchengetedza chamber symmetry uye thermal equilibrium, zvichiita kuti epitaxial layer ikure zvakaenzana uye dopant isanganiswe muma wafers akawanda. Nekuderedza kusvibiswa uye kuwedzera hupenyu hwebasa, fabs dzinogona kuwana mabhenefiti akakosha ekushanda: kuderedzwa kwenguva yekushanda, kudzikisa mari yese yekuva muridzi, kushanda kwemidziyo kwakagadziriswa, uye kudzora mashandiro kwakasimba.
Mavharo eSemixlab ane mavharo eTaC anogadzirwa achishandisa tekinoroji yepamusoro yeCVD Tantalum Carbide coating deposition, microstructure adhesion control, uye precision metrology kuti ive nechokwadi chekuti mavharo akasimba, hukobvu hwakaenzana, uye thermal shock resistance. Mavharo ekudzivirira anogona kugadzirwa kuti ashandiswe muzvitofu, MOCVD, LPCVD, uye vertical SiC/Si epitaxial platforms. Tinotarisira nemwoyo wese kuva mubatsiri wako wenguva refu muChina.
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