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Semixlab Girazi kabhoni yakavharwa graphite substrate
| Nzvimbo Yokutanga: | China |
| Brand Name: | Semixlab |
| Model Number: | Girazi kabhoni-01 |
| advertising: | ISO9001 |
| Minimum Order Yakawanda: | Zvichienderana nenhaurirano |
| Price: | Bata kune Customized quote |
| Packaging Details: | Chiyero chekunze chinotakurirwa kunze |
| Nguva Yokutora: | Nguva Yekutumira: Mazuva 15-30 Mushure meKusimbisa Kurongeka |
| Mitemo Yekubhadhara: | T / T |
| Kupa Mikana: | 10 matani / Mwedzi |
tsananguro
Girazi kabhoni yakanamirwa graphite substrate chinhu chakaumbwa chine graphite sechinhu chigadziko, chakamisikidzwa kana kuputirwa negirazi kabhoni, iyo inosanganisa yakanakisa conductivity uye yakakwirira tembiricha kuramba kwegraphite nehupamhi hwemakemikari inertness, density uye yakatsetseka pamusoro pemaitiro egirazi kabhoni.
Kuti tisangane nezvinoda kuitika zveindasitiri, isu takagadzira rakasiyana zvigadzirwa portfolio iyo yakashongedzerwa zvizere kuti isangane nezvinodiwa zvechizvarwa chinotevera coating tekinoroji, kuve nechokwadi kuti tinogona kupa mhinduro dzinofambirana nekufambira mberi kwazvino mumunda we semiconductor.
Application:
Kubva pamaonero eminda yekushandisa, huwandu hwekushandisa hwegirazi kabhoni yakavharwa graphite yakakura kwazvo. Mumunda we semiconductor zvinhu, nekuda kwekunaka kwayo kwepamusoro tembiricha kuramba, oxidation kuramba uye conductivity, yave chinhu chakanakira kugadzira yakakwirira-inoshanda yakabatanidzwa mabhodhi edunhu uye zvigadzirwa zvemagetsi. Mumunda wekuramba uchikandira zvinhu, girazi kabhoni yakavharwa graphite inoshandiswa zvakanyanya mukristallizer lining yeinoramba ichikanda michina nekuda kwekunaka kwayo uye kupisa kwekushisa kwepamusoro, zvinobudirira kuvandudza kuenderera kwekukanda kushanda uye kunaka kweingot. Uye zvakare, muminda yeaerospace, indasitiri yenyukireya, simbi, indasitiri yemakemikari, nezvimwewo, girazi kabhoni yakavharwa graphite inoitawo basa risingadzokerike.
Masevhisi anogona kupihwa:
Mutengi application mamiriro ekuongorora, kuenzanisa zvinhu, tekinoroji kugadzirisa dambudziko.
Chikamu chekambani:
Semixlab ine 2 marabhoritari, timu yenyanzvi ine makore makumi maviri eruzivo rwezvinhu, iine R&D uye kugadzira, kuyedza uye ongororo kugona.
Tsva Yekukurumidza:
a. Chikumbiro chikuru: Girazi kabhoni yakavharwa graphite substrates ine huwandu hwakasiyana hwekushandisa munzvimbo dzakasiyana siyana semiconductors, simba, yakakosha yekupfekedza matekinoroji uye ari kubuda matekinoroji nekuda kwekusiyana kwavo kwemuviri nemakemikari zvimiro. Nekuenderera mberi kwekufambira mberi kwetekinoroji, huwandu hwekushandisa kwayo uye kukosha zvinotarisirwa kuwedzera mberi.
b. Gadziriro nzira:
Coating process:
Iyo graphite substrate inonyudzwa mu carbonizable polymer precursor solution uye yunifomu yekuputira inoumbwa ne spin coating, spray coating kana kemikari vapor deposition (CVD).
High tembiricha carbonization:
Kurapa kwekushisa kwepamusoro (1000-3000 ° C) mumhepo inert (yakadai seargon) inoshandura polima kuita girazi kabhoni, iyo yakanyatsobatanidzwa kune graphite substrate.
c. Core specification parameters:
coating ukobvu (akasarudzwa maererano nharaunda inoora, ane optimum ukobvu 50-100μm); substrate graphite density (high density inonyanya kupikisa kupinda mukati); mamiriro ekushandiswa (oxidizing / inert); Kupisa mwero ≤10 ℃/min (kuderedza interface kushushikana); Kushandisa tembiricha mumhepo ≤600 ℃ (inert gasi dziviriro inodiwa kana ichipfuura)
Magadzirirwo
Kuenzanisa kwakakosha kwekuita
| Parameter | Girazi kabhoni yakavharwa graphite substrate | graphite yakachena | Pure girazi kabhoni |
| Kunonyanyisa kushanda tembiricha | 2800 ℃ mumhepo inert, 600 ℃ mumhepo | 3000 ℃ mumhepo inert, 600 ℃ mumhepo | 3000 ℃ mumhepo inert, 500 ℃ mumhepo |
| Thermal kuvhunduka kuramba | Yakanakisa (graphite substrate buffers thermal stress) | Excellent | murombo |
| HF corrosion resistance | Yakanakisa (coating protection) | murombo | Excellent |
| Kugadzirisa kuoma | Pakati (inoda nzira yekuputira) | Easy kugadzirisa | Zvakaoma kuita (zvakanyanya brittle) |
| Mutengo Wepakati | (≈2-3 nguva iyo yegirafu yakachena) | Low | High |
Applications
Main application fields
| Maitiro ekushandisa | Mamiriro ezvinhu chaiwo | mhinduro kukosha |
| Semiconductor kugadzira | Wafer heat treatment susceptor | Dzivirira graphite kubva pakuburitsa tsvina uye kusvibisa silicon wafers |
| Glassy carbon crucibles | MuBridgman kana Czochralski maitiro, inoshandiswa kukura makristasi ega eGaAs uye SiC. | Girazi kabhoni crucibles inogona kumira tembiricha yakakwira pamusoro pe2000 ° C uye iine yakanakisa yekupisa kuvhunduka. |
| High tembiricha epitaxial reactor zvikamu | Se susceptor ye substrates kana se liner ye reaction chambers | Kana uchikura GaN uye SiC epitaxial layers, iyo kemikari inertness yegirazi kabhoni inogona kudzivirira kuita nema precursors. |
| Plasma Etching Environment | Electrode kana mhete yekutarisa ye etching reaction chamber | Kudzivirira kukukurwa kweplasma uye kuburitswa kwechikamu chepasi |
| Zvitsva Zvishandiso zvePhotomask Substrates | EUV uye e-beam mafotomasks | Iyo coefficient yekuwedzera kwekupisa iri pedyo ne zero, iyo iri nani pane yechinyakare quartz girazi. Iyo yemagetsi conductivity inogona kungobvisa iyo electron beam charge |
| Melten metal kubata | Aluminium electrolytic cell cathode coating | Inodzivirira kune yakanyungudutswa yealuminium corrosion, inowedzera hupenyu hwesevhisi |
| Electrochemical electrode | Fuel cell bipolar plates | Girazi kabhoni layer yekudzivirira ngura uye graphite substrate yemagetsi conductivity |
| High tembiricha vacuum choto | Heating element protection layer | Deredza graphite volatilization pakupisa kwakanyanya |
| Zviridzwa zvekuongorora | Mass spectrometer ion source components | Kuchena kwepamusoro kunoderedza ruzha rwekumashure |
Ecological chain verification endorsement
Yakapfuura kuvimbika kusimbiswa nevagadziri vakaita seSinosteel
Corporation uye FangDa.
Yakajairika kugadzira maitiro
Sarudza substrate (graphite zvinhu zvine porosity ye10% -15%) → Kucheneswa kwepamusoro (1000-2000 rpm/min, 30-60min) uye preheating (150-200 ℃, 1-2h) → Kugadzirira kwephenolic resin solution (200-500 , viscos-30 rpm: 60 min / min, 500 rpm-1000 rpm) 30-50mpa·s) → Dip treatment(2-4℃, 5-10h, pressure: 150-200mpa) → Kupora tembiricha yakaderera(2-4℃, 1000-1h) → Carbonization treatment(2℃, 0.01-10h, 2500mpa ℃, XNUMXmpa)it kurapwa XNUMX ℃)
Kuburikidza nekuenderera mberi kwehunyanzvi hwekuvandudza tekinoroji uye kugadzirwa kwechigadzirwa, Semixlab yegirazi kabhoni yakavharwa graphite substrate yakawana budiriro mumidziyo yegirafu yemukati, ichisangana nekukura kuri kudiwa kwegirazi kabhoni yakavharwa graphite muminda yekucheka senge mota nyowani dzesimba, masisitimu ekuchengetedza simba, uye semiconductor zvinhu. Kana iwe uchida kuwana akadzama ehunyanzvi mapepa machena kana kuronga sampuli yekuyedza, ndapota taura neboka redu rekutsigira tekinoroji.
Kukwikwidza Kunobatsira
Semixlab Girazi kabhoni yakavharwa graphite substrate Core zvakanakira
Chemical nemishonga:
Inodzivirira kune yakasimba asidhi, alkali yakasimba, uye simbi dzakanyungudutswa (seAl uye Cu).
Kuchena kwepamusoro:
Kuchena kwepamusoro (ash content <0.01%).
Antioxidant:
Surface oxidation kuramba tembiricha yakawedzera kusvika 500-600 ℃.
Mechanical simba:
Wedzera kuoma kwepamusoro (kuderedza kupfeka).
Mariro:
30-50% yakaderera pane yakachena girazi kabhoni zvigadzirwa.
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