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Semiconductor Quartz Flow Baffle
Iyo Semixlab Semiconductor Quartz Flow Baffle chinhu chakanyatso-engineered chikamu chakagadzirirwa kudzora uye homogenize kuyerera kwegasi mukati meCVD, LPCVD, PECVD, diffusion, uye oxidation mavira. Yakagadzirwa kubva ku-ultra-high-purity fused quartz (SiO₂, ≥99.99%), inochengetedza tembiricha yakagadzikana uye kugoverwa kwegasi panguva yekugadzira wafer, zvinobudirira kuderedza firimu risiri-kufanana, kusvibiswa kwechikamu, uye nzvimbo yakawandisa. Kujeka kwayo kwepamusoro kwemaziso, kusarudzika kwekupisa kwemafuta, uye hunhu husina kusvibiswa hunoita kuti ive chinhu chinonyanya kukosha mune advanced semiconductor uye SiC/GaN epitaxy midziyo.
tsananguro
Ⅰ. Material uye Surface Hunhu
● Nyaya: High-purity fused silica (synthetic kana natural quartz, kuchena ≥99.99%).
● Thermal Resistance: Kushanda kwakagadzikana patembiricha inoenderera kusvika 1200°C.
● Surface Finish: Ultra-smooth precision-polished surfaces kudzivirira kunamatira kwechidimbu.
● Thermal Expansion: Low coefficient yekuwedzera (5.5×10⁻⁷/°C) inovimbisa kugadzikana kwedimensional.
● Kuramba Kwemakemikari: Kusapinda kumagasi anoparadza akadai seHCl, NH₃, uye SiH₄.
Yese inoyerera baffle inotariswa kwakaomarara kwemhando yepasi, kurongeka kwedimensional, uye yemukati bubble control, kuve nechokwadi chakafanana kuchena uye kuvimbika mubatch yega yega yekugadzira.
Ⅱ. Mabasa Akakosha muSemiconductor Maitiro
Iyo Quartz Flow Baffle inoshanda seyakakosha kuyerera kwekudzora uye yekupisa mutemo chikamu mukati mepamusoro-tembiricha semiconductor kugadzirisa makamuri. Basa rayo rinopfuura nekungotungamira magasi - rinoita basa rakasiyana-siyana mukudzikamisa nharaunda, kusimudzira kushandiswa kwezvinhu, uye kuve nechokwadi chekuti wafer-to-wafer kufanana.
1. Uniform Gasi Flow Distribution
Mumaitiro akadai seLPCVD, PECVD, uye epitaxy, yunifomu gasi kuendesa kwakakosha kuti uwane inopindirana yakaonda firimu kukura uye kugovera dopant. Iyo quartz inoyerera baffle yakanyatso gadziridzwa geometry - inosanganisira ayo ane angled kuyerera chiteshi, inotsauka curvature, uye yakagadziridzwa nzvimbo - inova nechokwadi chekuti magasi anoshanda anoparadzirwa zvakaenzana padenga rewafer. Nekuchengetedza iyo laminar kuyerera pateni, iyo inoyerera baffle inovimbisa kuti imwe neimwe wafer mukati mebatch inosangana neyakafanana gasi mamiriro ekuratidzwa, nekudaro ichiwedzera kugadzikana kwegoho uye kuenderana kwechigadzirwa.
2. Thermal Field Stabilization uye Heat Transfer Balance
Munguva yekupisa kwepamusoro-soro senge thermal oxidation kana Si epitaxial kukura, kunyangwe misiyano midiki mukugovera tembiricha inogona kukonzera kukanganisa kwekristaro, kuparadzaniswa, kana kushushikana kwefirimu.
Iyo quartz inoyerera baffle inoshanda semugadziri wekupisa:
● Inotsvedzerera tembiricha pakati pepakati nekumucheto kwechikepe
● Inoderedza kusaenzana kwekupisa mukati mechoto
● Inoderedza kupisa kunotyisa panguva yekukwira-kukwira kwekushisa uye kudzika-pasi kutenderera
3. Kusvibiswa Kudzvinyirira uye Maitiro Kuchena
Mukugadzira semiconductor, kudzora kusvibiswa kwakakosha. Metallic kana kusvibiswa kwesimbi kunogona kukanganisa zvakanyanya goho remudziyo. Iyo Quartz Flow Baffle, yakagadzirwa kubva ku-ultra-high-purity synthetic fused silica (SiO₂ ≥ 99.99%), inouyisa maioni esimbi kana masara ekabhoni mukamuri yekugadzira. Yayo yakatsetseka, isina-porous surface inodzivirira kuunganidzwa kwe reaction byproducts uye particle dedding. Izvi zvinogonesa kugadzikana kwemukamuri-giredhi kugadzikana kwemaitiro akakosha senge gedhi oxide kuumbwa, diffusion doping, uye CVD dielectric deposition.
Semixlab Quartz Flow Baffle haingori chinhu chinongoitika 一 chinhu chakakosha chinogonesa kugadzikana kwemaitiro, gasi kufanana, uye goho optimization. Kuburikidza nedhizaini yayo yepamberi yekuyerera dhizaini, yekupisa kuyera, uye yakanyanya-yakachena zvinhu kuumbwa, inova nechokwadi chekuti wafer yega yega inogamuchira yakanyatso kudzora maitiro nharaunda-yakakosha kune inotevera-chizvarwa semiconductor mudziyo wekugadzira.
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