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Yakakwirira kuchena quartz diffusion furnace chubhu
| Nzvimbo Yokutanga: | China |
| Brand Name: | Semixlab |
| Model Number: | Qwb-2025 |
| advertising: | ISO9001 |
| Minimum Order Yakawanda: | 10 |
| Price: | Bata kune Customized quote |
| Packaging Details: | Anti-Static Foam + Wooden crates (Customizable) |
| Nguva Yokutora: | Delivery Nguva: 20-35 Mazuva Mushure meOdha Kusimbiswa |
| Mitemo Yekubhadhara: | T / T |
| Kupa Mikana: | 1000 Units / Mwedzi |
tsananguro
Yakakwira kuchena quartz diffusion furnace chubhu yakanyatso gadzirirwa yakakwira tembiricha yekuparadzira maitiro mu semiconductor wafer kugadzira. Inogadzirwa ne-ultra-high purity synthetic quartz jecha (SiO2kuchena ≥99.999%). Sangana nezvinodiwa zvakaomesesa zvehutsanana, kugadzikana kwekupisa uye kusagadzikana kwemakemikari epamberi maitiro pazasi 7nm. Zvigadzirwa kuburikidza nearc kunyunguduka maitiro uye chaiyo machining tekinoroji, kuve nechokwadi kugadzikana kwechimiro munzvimbo ye1200 ℃ yakakwirira tembiricha, inoshandiswa zvakanyanya muphosphorus/boron doping, oxide kukura uye mamwe maitiro akakosha.
Core zvinhu uye maitiro
Ultra yakakwirira kuchena zvinhu
SiO₂ kuchena: ≥99.999% (5N giredhi), yakazara kusachena chinhu ≤2ppm (inoenderana neSEMI F63 chiyero).
Kudzora kusachena kwakakosha: Li+Na+K≤0.5ppm, Fe≤0.1ppm, Al≤0.3ppm, B≤0.05ppm (rega kupindira kwedoping).
Hydroxyl yemukati: ≤1ppm (mushure mekurapa dehydroxylation kudzivirira kukanganisa kwewafer kunokonzerwa nekupisa kwekushisa kwehydrogen).
Thermal performance optimization
Thermal yekuwedzera coefficient: 5.5 × 10-7K-1(20-1000 ° C), kudzivirira deformation kuparuka kunokonzerwa nekumwe kushanduka kwekushisa.
Kunyorovesa poindi: 1680 ℃, yenguva refu yekushanda tembiricha ≤1250 ℃ (tsigiro yekukurumidza kusimuka uye kutonhora maitiro).
Thermal shock resistance: inomira 1200 ℃→ tembiricha yekudzima kutenderera ≥200 nguva (ASTM C338 yakajairwa verification).
Kemikari inertness uye kuchena
Corrosion resistance: inopesana neHF, HCl, HNO₃ uye mamwe maasidhi akasimba (kuderedza uremu ≤0.005mg/cm²·h).
Kucheneswa kwepamusoro: Ra≤0.1μm (CMP kukwenenzverwa), tunhu tunhu ≤5/m2 (@0.1μm, maererano neISO Kirasi 1).
Metal pollution control: pamusoro pesimbi yakasara ≤0.1ppb (ICP-MS kuonekwa).
Tsva Yekukurumidza:
1. Mamwe mazita: Quartz reaction tube, tembiricha yehuni chubhu.
2. Kushandisa: Wafer diffusion process.
3. Core parameters: Kuchena ≥99.995%, kupisa kwekushisa 1600 ℃, mukati dhayamita 20-300mm.
Magadzirirwo
| Parameter | indekisi |
| Kuchena kwezvinhu | ≥99.995% SiO₂ |
| Kunonyanyisa kushanda tembiricha | 1600 ℃ (kuenderera mberi kushanda) |
| Thermal kuvhunduka kuramba | ΔT = 1000 ℃ kutonhora kwemvura hakuputsi |
| Mukati dhayamita renji | 20-300mm (± 0.5mm kushivirira) |
| Urefu hwakagadzirirwa | 500-3000mm |
Applications
High tembiricha diffusion doping.
Phosphorus/Boron solid state sosi diffusion (1000-1200 ℃).
Rapid thermal Annealing (RTA) maitiro (kukwira / kutonhora ≥100℃/s).
Kukwikwidza Kunobatsira
Ultra-yakakwirira kuchena uye crystallization kuramba, kuwedzera hupenyu hwehuto hwehuni.
Tsigira yakaoma dhizaini dhizaini, chinja kune akasiyana maitiro zvinodiwa.
Strict dimension tolerance control (± 0.5mm).
